abstract |
A photoresist composition includes: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): Wherein R 1 , R 2 and R 3 each independently represent a C1-C24 hydrocarbon group, wherein a hydrogen atom may be replaced by a substituent, and a methylene group thereof may be replaced by an oxygen atom, a sulfur atom, or a carbonyl group. |