| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C17-0103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate |
2006-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be835a103388ce1c8816005f37adda0b |
| publicationDate |
2011-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7968268-B2 |
| titleOfInvention |
Compositions and processes for immersion lithography |
| abstract |
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymers; and/or 4) polymeric particles. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10222699-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10180627-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9063425-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9156785-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9086628-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9563128-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008193872-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9046765-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11480878-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9136123-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008227025-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9171720-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014322648-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011003257-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014023968-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9244355-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8975006-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11500291-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9541834-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10678132-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015044609-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010173245-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11448964-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8916331-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2452932-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013065178-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11487203-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8871428-B2 |
| priorityDate |
2005-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |