| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6579f61638632967c26cf21ea3750a26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8443c54ad81d8b70a2234fd1d0041c39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_106f81cadca18c8722bf14d369c67bab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bffd32e6073275f0cf64b9612b160764 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-202
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2009-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7de699a05d2b8c4869ad1b5c2160563d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f99f5e76f31f71b5ea7e0fb889d4eb6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b52079deaa64244a9f218aa284ecbaf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35f6f69fbf81062255038b9e5229ea3f |
| publicationDate |
2015-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8975006-B2 |
| titleOfInvention |
Compositions comprising carboxy component and processes for photolithography |
| abstract |
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more block copolymers. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer dining immersion lithography processing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015378255-A1 |
| priorityDate |
2008-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |