| abstract |
PROBLEM TO BE SOLVED: To prevent a resist film from being softened by a liquid used in immersion lithography and obtain a fine pattern having a good shape. A resist material includes a first polymer 20A protected with an acid labile group in which some of the alkali-soluble groups are unstable by an acid, and an acid in which almost all of the alkali-soluble groups are unstable by an acid. It contains the second polymer 20B protected with a labile group and an acid generator. [Selection] Figure 3 |