| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2013-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c59485851f31050bab7984e3210153a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91e62a9ca5365dc0fd15480db51e2560
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be835a103388ce1c8816005f37adda0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cdb1388402fabe889cccadde8de93fe |
| publicationDate |
2014-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2014016643-A |
| titleOfInvention |
Compositions and methods for immersion lithography |
| abstract |
A novel photoresist composition useful in immersion lithography is provided that can reduce leaching of a resist material into an immersion fluid that contacts a resist layer during the immersion lithography process. Preferred photoresist compositions include one or more materials having a water contact angle that can be altered by treatment with a base, and / or one or more comprising a fluorinated photoacid labile group. And / or one or more materials containing acid groups spaced from the polymer backbone. [Selection figure] None |
| priorityDate |
2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |