Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C17-0103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2014-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be835a103388ce1c8816005f37adda0b |
publicationDate |
2014-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2014074934-A |
titleOfInvention |
Compositions and methods for immersion lithography |
abstract |
A novel photoresist composition useful for immersion lithography is provided. Preferred photoresist compositions of the present invention comprise one or more substances that are substantially immiscible with the resin component of the resist. Further preferred photoresist compositions of the present invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymer; and / or 4) polymer particles. Particularly preferred photoresists of the present invention can reduce leaching of the resist material into the immersion liquid in contact with the resist layer during the immersion lithography process. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016057712-A |
priorityDate |
2005-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |