| abstract |
An object of the present invention is to provide a photosensitive composition in which the occurrence of development defects is remarkably suppressed even when used for pattern formation after storage for a long period of time, and has excellent immersion liquid followability, and a pattern forming method using the same. . (A) a resin having a specific group having at least one halogen atom at at least one end of a molecular chain, the dissolution rate of which is increased in an alkaline developer by the action of an acid, and (B) The photosensitive composition containing the compound which generate | occur | produces an acid by irradiation of actinic light or a radiation, and the pattern formation method using the same. [Selection figure] None |