| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E06B7-2314
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E06B7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E06B7-231
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-08 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D493-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-492 |
| filingDate |
2005-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac0718ae5232ffcd9bd7648780e409bc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94be320ab77e8e1113b2306ca0a89a14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0add81bb44226ce3a7adcf9dd82631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfd817b3b4b7b6b42ab0ea6796adcec2 |
| publicationDate |
2005-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2005238993-A1 |
| titleOfInvention |
Nitrogen-containing organic compound, chemically amplified resist composition and patterning process |
| abstract |
Chemically amplified resist compositions comprising nitrogen-containing organic compounds having a 7-oxanorbornane-2-carboxylic ester structure have an excellent resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8871428-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8257902-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008193872-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006246373-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014322648-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10649329-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7968268-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11021514-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009117489-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9244355-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9563128-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010173249-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9696622-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10222699-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014308605-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11194254-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011255069-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8715902-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009123869-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009130592-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9213237-B2 |
| priorityDate |
2004-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |