| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C17-0103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2009-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be835a103388ce1c8816005f37adda0b |
| publicationDate |
2009-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009123869-A1 |
| titleOfInvention |
Compositions and processes for immersion lithography |
| abstract |
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched polymers; and/or 4) polymeric particles. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8753792-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2287670-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010015554-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011104610-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8192914-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009053650-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006292490-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2336824-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8900789-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009239176-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2287667-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8080363-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2363749-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8574813-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9034558-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2287669-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2287668-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8012665-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2492753-A2 |
| priorityDate |
2005-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |