http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10147585-B2

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filingDate 2014-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ec0be6e6272b58bae71bd5ff975e38f
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publicationDate 2018-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10147585-B2
titleOfInvention Plasma processing apparatus
abstract A plasma processing apparatus having a dielectric member that surrounds a circular chamber having a long shape and communicating with an opening portion having a long and linear shape, a gas supply pipe for introducing gas into an inside of the circular chamber, a coil provided in a vicinity of the circular chamber and having a long shape in parallel with a longitudinal direction of the opening portion, a high-frequency power supply connected to the coil, a base material mounting table that mounts a base material, and a moving mechanism that allows relative movement between the circular chamber and the base material mounting table in a perpendicular direction with respect to an longitudinal direction of the opening portion.
priorityDate 2011-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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