| abstract |
PURPOSE: To enable a formation of a fine pattern by preparing the titled composition from a resist comprising a mixture of cis-(1,3,5,7-tetrahydroxyl)-1,3,5,7- tetraphenylcyclotetrasi-loxane and a specific polysilsesquioxane and a phenolic resin soluble to an alkaline aqueous solution. n CONSTITUTION: The resist is composed of 5W100wt% prescribed mixture and the phenol resin soluble to the alkaline aqueous solution. Said mixture consists of (A) cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasil-oxane and (B) polysilsesquioxane shown by the formula wherein R 1 is a phenyl group and/or 1W4C alkyl group, a ratio of the phenyl group/the alkyl group is ≥1, R 2 is at least one of an element or a substituent selected from the groups of a hydrogen atom, the phenyl and 1W4C alkyl groups, the hydrogen atom is ≥1/2 the whole R 2 group. n COPYRIGHT: (C)1986,JPO&Japio |