| abstract |
A positive photosensitive composition which comprises (A) a silicone resin bearing, in one molecule, at least two groups represented by general formula (1) [wherein R1 is a C1-10 alkylene group which may have a substituent hydrocarbon group; R2 is a C1-4 alkyl group; a is a number of 0 or 1 to 4; and b is a number of 1 to 3, with the proviso that the sum of a and b does not exceed 5], (B) a siloxane compound bearing a glycidyl group, (C) a diazonaphthoquinone, and (D) an organic solvent. The permanent resist is produced by applying the positive photosensitive composition to a substrate, exposing the coated substrate to light, and then subjecting the resulting coated substrate to alkali development and then to post-baking at 120 to 350°C. |