| abstract |
PURPOSE: To enhance photosensitivity and to increase allowance to light sources by incorporating a compound producing an acid upon exposure to activated light beam or radiant ray and a specified organic polysiloxane compound. n CONSTITUTION: The positive type photosensitive composition contains the compound producing an acid upon exposure to activated light beam or radiant ray, such as diazonium, phosphonium, sulfonium, or organic halogen compounds, and the organic polysiloxane compd. having straight-chain one-dimensional structure, branched or ladder type two-dimensional structure, and/or three- dimensional reticular structure, and further, an alkali-soluble polymer, thus permitting the obtained composition to be enhanced in photosensitivity, increased in allowance to light sources, and easily and simply manufacturable, and to have superior oxygen plasma resistance. n COPYRIGHT: (C)1990,JPO&Japio |