| abstract |
PURPOSE:To permit application of a two layers resist method and formation of fine patterns by incorporating a polysiloxane resin having a specific structural unit and photosensitive compd. as essential components into a titled compsn. CONSTITUTION:This compsn. contains the polysiloxane resin having the structural unit expressed by the formula I and/or the structural unit expressed by the formula II and the photosensitive compsn. as the essential components. In the formulas, R1 denotes an alkyl group, vinyl group, etc., of 1-10C, R2-R6 respectively denote a hydrogen atom, halogen atom, alkyl group, etc., among which at least one is a hydroxyl group and the remaining groups may be the same or different, R7 denotes a substd. or unsubstd. alkyl group of 1-10C, substd. or unsubstd. aryl group, etc., of 6-14C, R8-R12 denote a carboxyl group or phenolic hydroxyl group or the group containing said group for at least one group among these groups and a hydrogen atom, halogen atom, alkyl group, etc. for the remaining groups. |