http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S61151643-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 1984-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd02bc4814688deaa00f64bd9bf2b111 |
| publicationDate | 1986-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S61151643-A |
| titleOfInvention | Photosoluble composition |
| abstract | PURPOSE:To obtain the titled composition having a high sensitivity, an excellent stability during a lapse of time and also capable of preservating during a long period by incorporating a compd. capable of generating an acid due to a radiation of an active ray, and a silylether compd. which has specific two kind constituting units and increases a solubility in a developer due to an action of acid, to the titled composition. CONSTITUTION:Said silylether compd. contains the constituting units shown by the formulas I and II in (99.9:1)-(10:90) a mol ratio of the compd. I/the compd. II and comprises the compd. shown by formula III and increases the solubility in the developer by an action of acid. The compd. capable of generating the acid due to the radiation of the active ray such as a laser beam, an electron beam, a UV etc. comprises for example, a diazonium and a phosphonium salts of BF<->4 and ClO<->4. The lithography plate which has a high sensitivity and performs a solubilization due to the radiation is prepared by dissolving said silylether compd., the prescribed compd. capable of generating the acid and an alkaline soluble resin such as a novolak phenol resin to the org. solvent such as ClCH2CH2Cl and cyclohexane and its mixture, and coating with the obtd. solution, an anodic oxidized Al substrate, heating and drying to form the photosensitive layer. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6225751-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63236029-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0285859-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S61167946-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S61166544-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S61169836-A |
| priorityDate | 1984-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.