| abstract |
An object of the present invention is to provide a resist composition capable of producing a negative resist pattern having excellent resolution and CD uniformity. A resist composition comprising a resin having an acid labile group, an acid generator and a salt represented by formula (I). [L 1 represents a single bond or a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, and the methylene group contained in the saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group. W 1 represents an alicyclic hydrocarbon ring having 3 to 36 carbon atoms, and the methylene group constituting the ring may be substituted with an oxygen atom, a sulfur atom, a carbonyl group, or a sulfonyl group. The hydrogen atom contained in may be substituted with a hydroxy group, a saturated hydrocarbon group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, or an aromatic hydrocarbon group having 6 to 10 carbon atoms. Z + represents an organic cation. ] [Selection figure] None |