abstract |
The resist composition has a resin containing a structural unit having an acid labile group, an acid generator, and a nonionic compound having a group represented by the formula (a) and having no unsaturated bond:nnIn the formulas, xa and xb each independently represent an oxygen atom or a sulfur atom, x1 represents a divalent c1 to c12 saturated hydrocarbon group having a fluorine atom or a fluorinated alkyl group of c1 to c6, . |