| abstract |
The present invention provides a resin and a resist composition that are useful for a resist composition having excellent CD uniformity and a low number of defects. A resist containing the following [1] and [1], an acid generator, and a solvent. [1] A resin having a structural unit represented by the formula (a). [In formula (a), Rf represents a fluorine atom or a fluorinated alkyl group. W represents an aliphatic ring having 3 to 36 carbon atoms. Rx represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom. ] [Selection figure] None |