| abstract |
An object of the present invention is to provide a self-assembling composition for pattern formation capable of forming a sufficiently fine pattern size or pitch size. The present invention includes two or more polymers not containing a silicon atom in the main chain, and at least one of the two or more polymers is bonded to the end of the main chain; A self-assembling composition for pattern formation having a group containing a hetero atom. The hetero atom is preferably at least one selected from the group consisting of an oxygen atom, a nitrogen atom, a sulfur atom, a phosphorus atom, a silicon atom and a tin atom. Moreover, it is preferable that the said group is represented by following formula (1). In the following formula (1), R 1 is a divalent organic group having 1 to 30 carbon atoms. In addition, the group represented by the following formula (1) is preferably derived from an epoxy compound. Moreover, it is preferable to contain a styrene polymer and a (meth) acrylic acid ester polymer as the polymer. [Selection] Figure 4 |