| abstract |
An object of the present invention is to provide a self-assembly composition for pattern formation, which is capable of forming a favorable phase-separated structure even in the case of forming a large size pattern. In addition, another object of the present invention is to provide a self-assembly composition for pattern formation, which is capable of forming a pattern by a simple process, with no need for preparation of a under layer, etc., upon formation of a fine pattern structure. The present invention relates to a self-assembly composition for pattern formation, which comprises a block copolymer comprising a polymerization unit (a) comprising two or more units consisting of at least one type selected from a glucose unit and a xylose unit, and a polymerization unit (b) comprising two or more units consisting of at least one type selected from an aromatic ring-containing unit, a silicon-containing unit and a metal-containing unit. |