| abstract |
A pattern forming method comprising: applying a base material on a substrate; and applying a self-organizing composition for pattern formation to a surface coated with a base material on a substrate to form a self-organizing film by self-organizing phase separation, (103) and (104), and a polymerized portion (b) having a structure represented by Formula (105), wherein the content of the sugar portion By mass of the block copolymer is not less than 3% by mass and not more than 80% by mass. (A) having at least one of the structures represented by formulas (103) and (104) and a polymerized portion (b) having a structure represented by formula (105) (Meth) acrylate-derived unit which may have a substituent and a styrene-derived unit which may have a substituent, which is used for phase-separating a self-organizing composition for pattern formation comprising a block copolymer having a ≪ / RTI > (103) and (104), a substrate comprising a substrate and a polymer containing at least one selected from a styrene-derived unit which may have a substituent and a (meth) acrylate-derived unit which may have a substituent, (B) having a structure represented by the formula (105) and having a sugar content of 3 mass% or more and 80 mass% or less, And a pattern forming layer in this order. |