| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_527d41cad118be2c39e19a33eab54468 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2438-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-54 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07H5-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F293-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F293-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F293-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07H5-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2017-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b3963badabbaf9ee529bbd7354ad27d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2f0cd4af41b5028c33af2a4d42079c4 |
| publicationDate |
2021-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11117996-B2 |
| titleOfInvention |
Self-assembly composition for pattern formation and pattern forming method |
| abstract |
It is an object of the present invention to provide a self-assembly composition for pattern formation having a wide range of applicable pattern size and being capable of forming a favorable phase-separated structure. The present invention relates to a self-assembly composition for pattern formation, which comprises a block copolymer comprising a polymerization unit (a) having at least one selected from a structure represented by the following formula (103) and a structure represented by the following formula (104), and a polymerization unit (b) having a structure represented by the following formula (105), wherein the content rate of a sugar moiety in the block copolymer is 3% by mass or more and 80% by mass or less based on the total mass of the block copolymer: |
| priorityDate |
2016-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |