| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-14 |
| filingDate |
2012-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d15835feeb1a7bd77386e5fa4161cf2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90276c3fc7ed227be052968bb970bcd8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e0a5be1d9b10e1384cfd329c0747c50 |
| publicationDate |
2013-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013166812-A |
| titleOfInvention |
Silicon-containing surface modifier, resist underlayer film forming composition containing the same, and pattern forming method |
| abstract |
Provided is a resist underlayer film that can be applied to a resist pattern formed from a hydrophilic organic compound obtained by negative development. A silicon-containing surface comprising any one or more of a repeating unit represented by the following general formula (A) and a partial structure represented by the following general formula (C). [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I610986-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170031086-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210152018-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013214041-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019181873-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150140223-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7212322-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11561472-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108885397-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108885397-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102382708-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102398792-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014056194-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022037041-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102310571-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10082735-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017170167-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017170167-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3770209-A1 |
| priorityDate |
2012-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |