http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150140223-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2015-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99ef24538b4b013992590b2198b18e9b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df899713455e8af99dc2d2b739499fc8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_424dbfcbafed8efc707b021e4a23ab93 |
| publicationDate | 2015-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20150140223-A |
| titleOfInvention | Composition for forming silicon-containing film, pattern forming method and polysiloxane compound |
| abstract | [PROBLEMS] To provide a composition for forming a silicon-containing film which has a high storage stability and can inhibit the occurrence of patterning and resist sticking in a multilayer resist process, particularly in the case of organic solvent development, and which is excellent in solvent resistance before curing . The present invention relates to a structure represented by (Q2), a structure represented by (Q3) and a structure represented by (Q4), and a structure represented by 29 Si (Q) calculated by the following formula (I), when the integral value of a signal given by each silicon atom in the structure expressed by the following formulas (Q1) to (Q4) among signals obtained by -NMR is q1 to q4 A polysiloxane compound having a value of 0.25 or less and a weight average molecular weight of 4,000 or less, and a solvent. q = (q1 + q2) / (q1 + q2 + q3 + q4) |
| priorityDate | 2014-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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