http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017170167-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2017-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2017170167-A1 |
| titleOfInvention | Surface treatment method and surface treatment liquid |
| abstract | A surface treatment method capable of forming a region having a high surface treatment effect and a region having a low surface treatment effect on the object to be treated, and capable of forming a hydrophilic or hydrophobic surface on the surface to be treated, and the surface treatment. A surface treatment solution preferably used for the method. In a surface treatment method for forming a thin film having a surface modification function with a film thickness of 10 nm or less by rinsing the exposed and baked photosensitive surface treatment solution, the photosensitive surface treatment solution (A) a resin, (B) a photoacid generator, and (C) a solvent, and (A) one or more selected from the group consisting of a hydroxyl group, a cyano group, and a carboxy group as the resin A resin having a functional group I which is a group and a functional group II which is a hydrophilic group or a hydrophobic group other than the functional group I, and (B) as a photoacid generator, the pKa is 1 by the action of light. The following compounds that generate strong acids are used. |
| priorityDate | 2016-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 280.