| abstract |
PROBLEM TO BE SOLVED: To finally obtain a negative image by giving a positive pattern resistance to an organic solvent used in a composition for forming a film for reversal as much as necessary and ensuring solubility in an alkaline etching solution. A pattern forming method by positive / negative reversal is performed by wet etching with an alkaline etching solution. At least a step of applying a positive resist composition to form a resist film, a step of exposing and developing the resist film to obtain a positive pattern, and a cross-linking to the obtained positive resist pattern A method of forming a resist pattern using positive / negative reversal, including a step of forming a reversal film, a step of forming a reversal film, and a step of reversing the positive pattern into a negative pattern by dissolving and removing with an alkaline wet etching solution. [Selection] Figure 1 |