| abstract |
PROBLEM TO BE SOLVED: To provide a composition for applying to a resist pattern and performing pattern inversion using an etching rate difference. A composition applied to a resist pattern comprising the following components (A) and (B): Component (A): metal oxide (a1), polyacid (a2), polyacid salt (a3), hydrolyzable silane (a4), hydrolyzate of the hydrolyzable silane (a5), and hydrolyzed above At least one compound selected from the group consisting of hydrolytic condensates (a6) of functional silanes; (B) component: including an aqueous solvent, Hydrolyzable silane (i) containing an organic group having an amino group, hydrolyzable silane (ii) containing an organic group having an ionic functional group, and an organic group having a hydroxyl group. The composition which is hydrolysable silane (iii) containing, or hydrolyzable silane (iv) containing an organic group having a functional group convertible to a hydroxyl group. [Selection figure] None |