abstract |
[Problem] To provide a composition for coating a resist pattern and using the difference in the etching rates to form a reverse of the pattern. [Solution] A composition which is applied to a resist pattern and includes component (A) and component (B). The composition includes: component (A), which is at least one compound selected from the group consisting of a metal oxide (a1), a polyacid (a2), a salt (a3) of a polyacid, a hydrolyzable silane (a4), a hydrolysate (a5) of the hydrolyzable silane, and a hydrolytic condensation product (a6) of the hydrolyzable silane; and component (B), which is an aqueous solvent. The hydrolyzable silane (a4) is (i) a hydrolyzable silane that includes an organic group having an amino group, (ii) a hydrolyzable silane that includes an organic group having an ionic functional group, (iii) a hydrolyzable silane that includes an organic group having a hydroxyl group, or (iv) a hydrolyzable silane that includes an organic group having a functional group that is convertible to a hydroxyl group. |