Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02137 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76801 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
filingDate |
2010-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa485c7f56d146cd9f855a87b1388ab7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_424dbfcbafed8efc707b021e4a23ab93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1facff11c74801421334a59851ec009b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_587775c2e54656b916ab8a22c9214dee |
publicationDate |
2011-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2011248242-A |
titleOfInvention |
Insulating pattern forming method and insulating pattern forming material for damascene process |
abstract |
PROBLEM TO BE SOLVED: To provide an insulating pattern forming method and a resin composition capable of easily forming a multilayer structure without performing a complicated etching process. [I] a step of forming an organic pattern on a substrate; (II) a step of embedding an insulating material between patterns of the organic pattern; [III] removing the organic pattern, obtaining a reversal pattern made of the insulating material; [IV] a step of curing the obtained reverse pattern; An insulating pattern forming method and an insulating pattern forming material for a damascene process are provided. [Selection] Figure 1 |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014157301-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7263708-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015125387-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101691254-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180019079-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014157299-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101661391-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150077307-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102188815-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140103053-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102460463-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014157246-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140103857-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020012951-A |
priorityDate |
2010-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |