| abstract |
It is sensitive to high energy rays of ultraviolet rays, far ultraviolet rays, electron beams, EUV, X-rays, excimer lasers, γ rays, or synchrotron radiation, and is represented by one of the following general formulas (1a) or (1c). Photoacid generator for chemically amplified resist material that generates sulfonic acid. R 1 -COOCH (CF 3) CF 2 SO 3 - H + (1a) R 1 -O-COOCH (CF 3 ) CF 2 SO 3 - H + (1c) (R 1 represents a hydrocarbon group having 20 to 50 carbon atoms having a steroid skeleton.) [Effects] The photoacid generator of the present invention has good compatibility with the resins in the resist material and can control acid diffusion. Moreover, these photo-acid generators which generate | occur | produce sulfonic acid can be used without a problem in the process of application | coating in a device preparation process, baking before exposure, exposure, baking after exposure and image development. [Selection figure] None |