| abstract |
A resist composition which generates an acid upon exposure to light and changes its solubility in a developer by the action of an acid, comprising a base component (A) in which the solubility in a developer is changed by the action of an acid, of containing the component (B) an acid generator, and a resist composition comprising the compound (B0-1) represented by the following formula (b0) component (B) the acid generator, wherein, Yx 01 is Is a divalent linking group, and n is an integer of 1 to 3. M ' m + is an organic cation of m. |