http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019066550-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2017-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_098a707d3e7994b181d3da1339cce7f9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f1784d8d5536c8f0a015741a46eecbd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80aad4f24f996497f9eae0b0e77b42ee |
publicationDate | 2019-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2019066550-A |
titleOfInvention | Resist composition and method for forming resist pattern |
abstract | The present invention provides a resist composition and a method for forming a resist pattern that can form a resist pattern with better lithography properties. A resist composition comprising a base component (A) whose solubility in a developer changes due to the action of an acid, and a compound (B1) represented by the general formula (b1) is employed. In the formula, R b1 represents a C 17 to C 50 monovalent hydrocarbon group having a steroid skeleton. However, the hydrocarbon group may contain a hetero atom. Y b1 represents a divalent linking group containing at least one functional group selected from the group consisting of a carboxylic acid ester group, an ether group, a carbonic acid ester group, a carbonyl group and an amide group, or a single bond. V b1 represents an alkylene group, a fluorinated alkylene group or a single bond. One of R f1 and R f2 is a hydrogen atom, and the other is a fluorine atom. m is an integer of 1 or more, and M m + represents an m-valent organic cation. [Chemical formula 1] 【Selection chart】 None |
priorityDate | 2017-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 358.