| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of obtaining a good pattern without causing the problem of poor compatibility between an acid generator and a polymer having an acid dissociable group which is a main component of a photoresist. . A solution obtained by dissolving a photosensitive polyhydric phenol derivative, in which an organic group represented by the following formula (1) is introduced into a polyhydric phenol that is not a polymer, in an organic solvent. [Chemical 1] (In Formula (1), R 1 is a linear or branched divalent organic group having 2 to 9 carbon atoms, and R 2 to R 5 are each independently a hydrogen atom or a linear or branched carbon number 1 to 1. R 6 and R 7 are each independently an organic group, and R 6 and R 7 may be combined to form a divalent organic group, where X − is an anion. Represents.) [Selection figure] None |