http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101547356-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-124 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-08 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2009-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101547356-B1 |
| titleOfInvention | A resist composition, a resist pattern forming method, a novel compound and an acid generator |
| abstract | (B1-1), a compound represented by formula (b1-1 ') and / or a compound represented by formula (b1-1 ") in which the solubility in an alkali developing solution is changed by the action of an acid, A resist composition containing an acid generator component (B) containing a compound represented by formulan n n [Chemical Formula 1]n n n n n n n n Wherein R 1 " to R 3 " represents an aryl group or an alkyl group, at least one of them is a substituted aryl group substituted with a group represented by the formula (b1-1-0) And may form a ring with the sulfur atom. X is a hydrocarbon group having 3 to 30 carbon atoms, Q 1 is a divalent linking group containing a carbonyl group, and p is an integer of 1 to 3. X 10 is a hydrocarbon group having 1 to 30 carbon atoms, Q 3 is a single bond or a divalent linking group, Y 10 is -C (═O) - or -SO 2 -, and Y 11 is an alkyl group or a fluorinated alkyl group having 1 to 10 carbon atoms . Q 2 is a single bond or an alkylene group. And W is an alkylene group having 2 to 10 carbon atoms. |
| priorityDate | 2008-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 335.