http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010138158-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C317-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 |
| filingDate | 2009-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52cce40b8476edb4278cec332665b093 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_321d114d76108c3dfde0d4c0b5877dde http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5629ea1962b41d0773eaf45e8af40283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b371d878503af0da2b50566aef90ca7d |
| publicationDate | 2010-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010138158-A |
| titleOfInvention | Resist composition, resist pattern forming method, novel compound, and acid generator |
| abstract | Provided are a compound useful as an acid generator for a resist composition, an acid generator, a resist composition, and a method for forming a resist pattern. A resist composition comprising a base component (A) whose solubility in an alkaline developer is changed by the action of an acid, and an acid generator component (B) that generates an acid upon exposure, the resist composition comprising: The resist composition in which the generator component (B) contains a compound represented by the following general formula (b1-1). [Wherein, R 51 to R 53 each independently represents an aryl group or an alkyl group which may have a substituent, and at least one of R 51 to R 53 has a hydrogen atom partially represented by the following general formula: A substituted aryl group substituted with a group represented by (b10-1), and any two of R 51 to R 53 may be bonded to each other to form a ring together with the sulfur atom in the formula; . ] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022024856-A1 |
| priorityDate | 2008-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 357.