| abstract |
PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in lithography properties such as resolution, resist pattern shape, depth of focus width and the like. A positive resist composition comprising a resin component (A) whose alkali solubility is increased by the action of an acid, an acid generator component (B) that generates acid upon exposure, and an organic solvent (C). The component (B) has the following general formula (I) [wherein R 1 , R 2 and R 3 are each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, or 1 to 1 carbon atoms. 6 alkoxy groups, which may be the same as or different from each other; p and q each independently represent an integer of 1 to 7; r represents an integer of 1 to 5; and X − represents sulfonium. It is a sulfonium salt represented by an anion capable of forming a salt]. [Chemical 1] [Selection figure] None |