| abstract |
The present invention provides a method capable of performing good immersion lithography and simultaneously performing development of a resist film and removal of a protective film at the same time during alkali development, and a protective film and a material therefor. . A polymer compound having a repeating unit represented by the formula (1) and a protective film containing the polymer compound are used. (Wherein R 1 and R 2 are a hydrogen atom or a methyl group, R 3 is an alkylene group having 1 to 12 carbon atoms or an alkylidine group, R 4 and R 5 are alkylene groups having 1 to 12 carbon atoms. A, b 1 , B 2 are in the range of 0 <a <1, 0 ≦ b 1 <1, 0 ≦ b 2 <1, 0 <b 1 + b 2 <1, 0 <a + b 1 + b 2 ≦ 1, n is 1 or 2) [Selection figure] None |