abstract |
Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5).nIn the formula, R 1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R 2 or R 3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution. |