abstract |
【Task】 Provided is a top coat composition which is provided on a resist film and protects the resist film, and which has appropriate developer solubility. [Solution] A topcoat composition for a photoresist, comprising a fluoropolymer having a repeating unit represented by the following general formula (5). [Chemical 1] [Wherein R 1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. n is 0 or 1, and m is an integer of 1 to (3 + n). R 2 or R 3 represents a hydrogen atom or a protecting group. ] [Selection figure] None |