abstract |
PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition for an immersion process and a pattern forming method using the same, in which fluctuations in sensitivity during immersion exposure and deterioration of line edge roughness are improved. (A) a resin that decomposes by the action of an acid and has increased solubility in an alkali developer; (B) a compound that generates an acid upon irradiation with an actinic ray or radiation, (C) a solvent and (D) a surfactant, and (D) a surfactant content of 10 ppm or less, and a chemically amplified resist composition for an immersion process, and the use thereof Pattern formation method. [Selection figure] None |