| abstract |
(57) [Abstract] [PROBLEMS] Chemical amplification which is effective in realizing defect reduction necessary for comprehensive quality control, has excellent sensitivity and resolution, does not cause coating unevenness, and provides a good resist pattern shape. A positive resist composition is provided. SOLUTION: (A) a compound which generates an acid upon irradiation with radiation, (B) a resin whose solubility in an alkali is increased by the action of an acid, and (C) a tertiary aliphatic amine or (D) an organic compound, if desired. In the chemically amplified positive resist composition containing carboxylic acid or both (C) and (D), the content of the surfactant is adjusted to 50 ppm or less. |