| abstract |
(57) [Problem] To provide a positive photoresist composition for deep ultraviolet exposure, which has improved line edge roughness, and furthermore has excellent resist characteristics such as sensitivity, resolution, resist shape and depth of focus. SOLUTION: (A) a compound which generates an acid upon irradiation with actinic rays or radiation, (B) a resin which is insoluble or hardly soluble in alkali and becomes alkali-soluble by the action of an acid, and (C) a specific nitrogen-containing resin A positive photoresist composition containing a nitrogen-containing compound having at least one partial structure in a molecule. |