| abstract |
A novel light-absorbing crosslinkable composition suitable for use as an anti-reflective composition (ARC), particularly for forming an image at a short wavelength such as 193 nm. Offer things. (A) providing a layer of an antireflective composition containing a resin binder having a phenyl group on a substrate; (B) curing the anti-reflective composition layer; (c) providing a layer of the photoresist composition over the anti-reflective composition layer; (d) exposing the photoresist layer with activating radiation; And developing the exposed layer of photoresist; and a method for forming a photoresist relief image. The ARCs are preferably used with an overcoated resist layer (ie, with the ARCs as the bottom layer), In general, it contains a novel ARC resin binder and can effectively absorb reflected exposure irradiation light of less than 200 nm. |