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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
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filingDate 1996-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_030d834d1b878634403cec0bb127167d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_963b2468f8078b40ee1a5d8c571bd978
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publicationDate 1997-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H09258451-A
titleOfInvention Method for forming photosensitive resin film pattern and method for manufacturing semiconductor device
abstract (57) Abstract: To provide a method for forming a resist pattern having a good shape. SOLUTION: A step of sequentially forming an organic film and a photosensitive resin film on a workpiece, a step of selectively exposing the photosensitive resin film, and a development of the selectively exposed photosensitive resin film. And a step of forming a photosensitive resin film pattern, wherein the organic film is a first substance that generates a radical by the exposure, is excited, or generates an acidic or basic decomposition product. A second substance that acts as a radical scavenger for the radicals, acts as a quencher for the first substance, or neutralizes the acidic or basic decomposition product. And
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