| abstract |
PROBLEM TO BE SOLVED: To sufficiently suppress reflected light from a substrate, exhibit an excellent anti-reflection effect, have good conformal properties and coating performance on a stepped substrate, and are less likely to generate sublimates for lithography. Provide a base material. SOLUTION: (A) a crosslinking agent selected from nitrogen-containing compounds having at least two amino groups substituted with a hydroxyalkyl group or an alkoxyalkyl group or both, and (B) a crosslinking agent having at least one hydroxyl group. A polymer or copolymer obtained by using at least one ester of acrylic acid or methacrylic acid with at least one hydroxy compound selected from bisphenylsulfones and benzophenones as at least a part of a monomer, and optionally (C) A base material for lithography containing a high light-absorbing substance. |