http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2426558-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2011-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaad9bd9825740415c92323cd331a4ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ade811a6374263791ea9df47b2bcecea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c3efc583b29ddad0c8d69842a3e0c5a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a26cda90ce9b40fd343e5fe443bceb31 |
| publicationDate | 2012-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-2426558-A1 |
| titleOfInvention | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process |
| abstract | There is disclosed a thermosetting silicon-containing film-forming composition for forming a silicon-containing film to be formed in a multi-layer resist process used in lithography, wherein the composition comprises at least:(A) a silicon-containing compound obtained by hydrolysis-condensation of a hydrolyzable silicon compound and compound(s) selected from the group consisting of a hydrolyzable silicon compound and a reactive compound; (B) a thermal crosslinking accelerator; (C) an organic acid with one, or two or more valency having 1 to 30 carbon atoms; and (D) an organic solvent. There can be provided a thermosetting silicon-containing film-forming composition, wherein, in a multi-layer resist process used in lithography, the composition is capable of forming an excellent pattern with suppressed reflection even under a high NA exposure condition upon formation of a resist pattern subsequently after formation of a photoresist film onto a silicon-containing film formed on an organic film, capable of forming a silicon-containing film usable as an excellent dry etching mask between the photoresist film that is an upperlayer film of the silicon-containing film and the organic film that is an underlayer film thereof, and excellent in etching selectivity to the upperlayer photoresist. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I756588-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3657254-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109585682-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109585682-B |
| priorityDate | 2010-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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