http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018061512-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2065 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-10 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2017-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c60ceb97ffa8c2ffcb34d3c17b95dc3f |
| publicationDate | 2018-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2018061512-A1 |
| titleOfInvention | Pattern forming method, method for producing electronic device, and active light sensitive or radiation sensitive composition |
| abstract | Provided are: a pattern forming method which is capable of forming a pattern with excellent surface properties when an active light sensitive or radiation sensitive film having a thick film thickness is formed; a method for producing an electronic device; and an active light sensitive or radiation sensitive composition. This pattern forming method comprises the steps (i), (ii) and (iii) described below.n(i) a step for forming an active light sensitive or radiation sensitive film having a film thickness that is thicker than 9 μm but not thicker than 20 μm with use of an active light sensitive or radiation sensitive composition containing a solvent (S) that satisfies a specific conditionn(ii) a step for irradiating the active light sensitive or radiation sensitive film with active light or radiationn(iii) a step for developing the active light sensitive or radiation sensitive film, which has been irradiated with active light or radiation, with use of a developer liquid |
| priorityDate | 2016-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 275.