| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa7d8eacceba9d48d333481afef1beec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7699d1e3ac78c69be248d108d9bb0116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a974e3919146809981f2d573f5b999ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-952 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2004-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_837b591393e57f39ea10ce124001288e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ac403d8bbd5937ab0dea42b17029b03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6720f6ef1fe0bb5810faf1caad0665dc |
| publicationDate |
2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2005022261-A1 |
| titleOfInvention |
Polyamide acid-containing composition for forming antireflective film |
| abstract |
[PROBLEMS] Disclosed is a composition for forming an antireflective film which is used in the lithography process in semiconductor device production and can be developed with an alkaline developing solution for photoresists. Also disclosed is a method for forming a photoresist pattern by using such a composition for forming an antireflective film. [MEANS FOR SOLVING PROBLEMS] The composition for forming an antireflective film contains a polyamide acid produced from a tetracarboxylic acid dianhydride compound and a diamine compound having at least one carboxyl group, a compound having at least two epoxy groups and a solvent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110869851-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE46841-E
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009534710-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8202678-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019012716-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190120234-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014530386-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4525940-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2006040922-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11319514-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7184036-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007031540-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019012716-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017098936-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019537043-A |
| priorityDate |
2003-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |