| abstract |
The present invention provides a composition for forming an underlayer film. The material of the composition for forming an underlayer film has a high solubility in organic solvents, and can form an underlayer film that is difficult to crack by heat treatment in the atmosphere at a relatively low temperature. When there is an underlayer film, the residual rate of the coating film with respect to the organic solvent is high. The present invention is a composition for forming an underlayer film and a method for forming a pattern. The composition for forming an underlayer film comprises a copolymer and an organic solvent, the copolymer has a polymer part a and a polymer part b, and the polymer part a has a sugar derivative part, The sugar derivative part is at least one of a five-carbon sugar derivative part and a six-carbon sugar derivative part, the polymer part b does not have a sugar derivative part, and the underlayer film forming composition is an underlayer film formation for pattern formation use. |