http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019012716-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08B37-0012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F299-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2017-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2019012716-A1 |
| titleOfInvention | Underlayer film forming composition, pattern forming method, and pattern forming underlayer film forming copolymer |
| abstract | The solubility of the material of the underlayer film forming composition in an organic solvent is high, and it is possible to form an underlayer film that is difficult to crack by heat treatment in the atmosphere and at a relatively low temperature, and when the underlayer film is formed, the coating film residual ratio to the organic solvent The provision of an underlayer film forming composition having high composition. A copolymer and an organic solvent, the copolymer has a polymerized portion a and a polymerized portion b, the polymerized portion a has a sugar derivative portion, and the sugar derivative portion is at least one of a pentose derivative portion and a hexose derivative portion, Polymerization part b does not have a sugar derivative part, and is an underlayer film forming composition used for pattern formation for forming an underlayer film; a pattern forming method. |
| priorityDate | 2017-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 365.